The information listed below is current as of the date the transcript was finalized.
Abstract of Interview
Elsa Reichmanis begins the interview with a description of her family's immigration to the United States and her childhood years in Syracuse, New York. Reichmanis developed an interest in chemistry after taking a high school chemistry course. After graduating a year early from high school, she enrolled at Syracuse University. While obtaining her B.S. in chemistry, Reichmanis performed heteroaromatic chemistry research in Apostolos G. Anastassiou's laboratory. Completing her degree in three years, she decided to remain at Syracuse University for her PhD Upon matriculation, Reichmanis took a technical staff position at AT&T Bell Laboratories, which is currently known as Bell Labs, Lucent Technologies, where she still remains. Reichmanis' work has focused on deep-UV lithography, such as the creation of 248 nm and 193 nm resist technologies. Currently, she is performing photonic research. While at Bell Labs, Reichmanis has held numerous positions ranging from technical staff to supervisor to director. Elsa Reichmanis concludes the interview with a discussion of Valerie J. Kuck's research on women in chemistry, the definition of innovation, and the future of chemistry.
|1975||Syracuse University||PhD||Organic Chemistry|
Phi Beta Kappa
R&D 100 Award, Research and Development Magazine
Society of Women Engineers Achievement Award
Elected to the National Academy of Engineering
AT&T Bell Laboratories Fellow
ASM International Engineering Materials Achievement Award
Elected Fellow of the American Association for the Advancement of Science
Photopolymer Science and Technology Award
Award in Applied Polymer Science, American Chemical Society
Perkin Medal, Society of Chemical Industry
George Arents Pioneer Medal, Syracuse University
Table of Contents
Parents. Family. Emigration from Australia to the United States. Growing up in Syracuse, New York. Importance of education. Beulah P. Durr. Budding interest in chemistry. Assessment of current science and mathematics education in public schools. Hobbies.
Graduating early from high school. Applying to Syracuse University. Undergraduate research. Apostolos G. Anastassiou. Heteroaromatic chemistry. Finishing college in three years. Decision to stay at Syracuse University for graduate school. Ph.D. dissertation. Weizmann Fellowship.
The Bell Labs reputation. Reflections on meeting and marrying Francis J. Purcell. Interest in deep-UV lithography. Larry F. Thompson and Murrae J. Bowden. The importance of knowing one's limitations. Laboratory budgets. Technology-licensing program. Research into deep-UV resists. Edwin A. Chandross and Cletus W. Wilkins, Jr. 248 nm resists. Francis M. Houlihan and Thomas X. Neenan. SEMATECH and Olin Ciba-Geigy Microelectronic Materials, Inc. (now Arch Chemicals, Inc. ) contract for the commercialization of 248 nm technologies. Promotion to supervisor, radiation sensitive materials and applications group. Birth of children. 193 nm technology. Promotion to director of polymer and organic chemistry research. Agree Systems, Inc. Photonics.
Thoughts on mentoring young scientists. Valerie J. Kuck's research. Women in chemistry. Definition of innovation. Serendipity and research. The future of chemistry.
About the Interviewer
David C. Brock is a senior research fellow with the Center for Contemporary History and Policy at the Chemical Heritage Foundation. As a historian of science and technology, he specializes in the history of semiconductor science, technology, and industry; the history of instrumentation; and oral history. Brock has studied the philosophy, sociology, and history of science at Brown University, the University of Edinburgh, and Princeton University.
In the policy arena Brock recently published Patterning the World: The Rise of Chemically Amplified Photoresists, a white-paper case study for the Center’s Studies in Materials Innovation. With Hyungsub Choi he is preparing an analysis of semiconductor technology roadmapping, having presented preliminary results at the 2009 meeting of the Industry Studies Association.